Invention Grant
- Patent Title: Insulation structure and insulation method
- Patent Title (中): 绝缘结构和绝缘方法
-
Application No.: US14291766Application Date: 2014-05-30
-
Publication No.: US09281160B2Publication Date: 2016-03-08
- Inventor: Masateru Sato
- Applicant: SEN Corporation
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Current Assignee: Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Michael Best & Friedrich LLP
- Priority: JP2013-115318 20130531
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J37/02 ; H01J27/02 ; H01J37/317

Abstract:
An insulation structure provided among a plurality of electrodes for extraction of an ion beam from a plasma generating section is provided. The insulation structure includes an insulation member including a first part connected to a first electrode and a second part connected to a second electrode and configured to support the first electrode to the second electrode, a first cover surrounding at least a part of the first part to protect the first part from contamination particles, and a second cover surrounding at least a part of the second part to protect the second part from contamination particles. At least one of the first part and the second part is made of a machinable ceramic or a porous ceramic.
Public/Granted literature
- US20140353518A1 INSULATION STRUCTURE AND INSULATION METHOD Public/Granted day:2014-12-04
Information query