Invention Grant
US09287084B2 Aberration corrector and charged particle beam apparatus using the same
有权
畸变校正器和使用其的带电粒子束装置
- Patent Title: Aberration corrector and charged particle beam apparatus using the same
- Patent Title (中): 畸变校正器和使用其的带电粒子束装置
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Application No.: US14607736Application Date: 2015-01-28
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Publication No.: US09287084B2Publication Date: 2016-03-15
- Inventor: Zhaohui Cheng , Hideo Kashima , Hiroaki Baba , Takeyoshi Ohashi , Tomonori Nakano , Kotoko Urano , Naomasa Suzuki
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2014-037630 20140228
- Main IPC: G21K1/093
- IPC: G21K1/093 ; H01J3/24 ; H01J37/153
Abstract:
Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.
Public/Granted literature
- US20150248944A1 ABERRATION CORRECTOR AND CHARGED PARTICLE BEAM APPARATUS USING THE SAME Public/Granted day:2015-09-03
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