发明授权
- 专利标题: Defect inspection method and defect inspection device
- 专利标题(中): 缺陷检查方法和缺陷检查装置
-
申请号: US14232929申请日: 2012-06-28
-
公开(公告)号: US09291574B2公开(公告)日: 2016-03-22
- 发明人: Shunichi Matsumoto , Atsushi Taniguchi , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
- 申请人: Shunichi Matsumoto , Atsushi Taniguchi , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
- 申请人地址: JP Tokyo
- 专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Miles & Stockbridge P.C.
- 优先权: JP2011-211885 20110928
- 国际申请: PCT/JP2012/066561 WO 20120628
- 国际公布: WO2013/046836 WO 20130404
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; G01N21/95 ; G01N21/956 ; H01L21/66
摘要:
A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a table, with illumination light from an inclined direction to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through oval shaped lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light.
公开/授权文献
- US20140268122A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE 公开/授权日:2014-09-18