发明授权
US09291909B2 Composition comprising a polymeric thermal acid generator and processes thereof
有权
组合物，其包含聚合物热酸产生剂及其工艺
- 专利标题： Composition comprising a polymeric thermal acid generator and processes thereof
- 专利标题（中）： 组合物，其包含聚合物热酸产生剂及其工艺
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申请号： US13896936申请日： 2013-05-17
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公开(公告)号： US09291909B2公开(公告)日： 2016-03-22
- 发明人: Hengpeng Wu , SungEun Hong , Yi Cao , Jian Yin , Margareta Paunescu , Muthiah Thiyagarajan
- 申请人： Hengpeng Wu , SungEun Hong , Yi Cao , Jian Yin , Margareta Paunescu , Muthiah Thiyagarajan
- 申请人地址： LU Luxembourg
- 专利权人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- 当前专利权人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- 当前专利权人地址： LU Luxembourg
- 代理商 Mitchell Brustein
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; C08F220/34 ; G03F7/40 ; C08F226/10 ; C08F8/44 ; C09D133/14 ; C09D139/06 ; G03F7/00 ; H01L21/027 ; G03F7/004 ; G03F7/039
摘要：
The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; where R1 to R5 are independently chosen from the group consisting of H and C1-C6 alkyl; R6 is chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C1-C8) and fluoroalkyl (C1-C8) and W is a C2-C6 alkylene spacer.
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