-
公开(公告)号：US11630390B2
公开(公告)日：2023-04-18
申请号：US15999429
申请日：2017-01-20
摘要： To provide a negative type photosensitive composition curable at a low temperature and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability, and also to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: an alkali-soluble resin, a compound having two or more (meth)acryloyloxy groups, a polysiloxane, a polymerization initiator, and a solvent. The alkali-soluble resin is a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit.
-
公开(公告)号：US11221558B2
公开(公告)日：2022-01-11
申请号：US16324299
申请日：2017-08-02
IPC分类号： G03F7/09 , C09D125/18 , C09D133/14 , G03F7/16 , G03F7/20 , G03F7/30
摘要： [Problem to be Solved] To provide a bottom antireflective coating forming composition which can show high etching resistance and can be crosslinked even at a relatively low temperature. Further, to provide a resist pattern manufacturing method and a device manufacturing method using the same. [Solution] The bottom antireflective coating forming composition comprises: a polymer A comprising specific repeating units; a low molecular crosslinking agent having a molecular weight of 100 to 3,000; and a solvent. The resist pattern manufacturing method and the device manufacturing method using the same are also provided.
-
公开(公告)号：US11169443B2
公开(公告)日：2021-11-09
申请号：US16090992
申请日：2017-04-03
发明人： Xiaowei Wang , Tatsuro Nagahara
摘要： There is provided a gap filling composition which can reduce pattern collapse and a pattern forming method using the composition. There is provided a gap filling composition including a gap filling compound, an organic solvent, and as required, water, the gap filling compound having a certain structure and containing hydroxyl groups, carboxyl groups, or amino groups intramolecularly. There is provided a pattern forming method using a low molecular weight compound.
-
公开(公告)号：US10822459B2
公开(公告)日：2020-11-03
申请号：US16316759
申请日：2017-07-14
摘要： The present invention relates to a formulation suitable for the preparation of a highly refractive encapsulation material with good barrier properties towards water vapor for an LED, to an encapsulation material for an LED having a high refractive index and good barrier properties towards water vapor which is obtainable from said formulation and to a light emitting device (LED) comprising said encapsulation material. The formulation comprises a polymer comprising a first repeating unit U1 and a second repeating unit U2; and a surface-modified nanoparticle, wherein the surface-modified nanoparticle does not contain any zirconium dioxide.
-
公开(公告)号：US10563093B2
公开(公告)日：2020-02-18
申请号：US16096116
申请日：2017-04-28
发明人： Yoshio Nojima , Masakazu Kobayashi
摘要： [Object] To provide a polysilazane-containing composition for forming a film. In order to form a dense and processable siliceous film, the composition is intended to be employed in a two-step conversion process comprising the steps of: forming a film having a dry surface from the composition provided that the conversion in to the siliceous substance proceeds insufficiently; and then subjecting the film to secondary processing. [Means] The present invention provides a polysilazane-containing film-forming composition comprising a particular amine compound, a polysilazane compound, and a solvent; and the invention also provides a process for forming a siliceous substance. In the process, the composition is applied to coat a substrate and thereafter converted into the siliceous substance. The particular amine compound has two amine groups, and the amine groups have at least one phenyl-substituted hydrocarbon group.
-
公开(公告)号：US20190153307A1
公开(公告)日：2019-05-23
申请号：US16089527
申请日：2017-03-29
摘要： The present invention relates to a color conversion sheet (100) and an optical device comprising a color conversion sheet (100). The present invention further relates to a use of the color conversion sheet (100) in an optical device (200). The invention further more relates to method for preparing the color conversion sheet (100) and method for preparing the optical device (200).
-
7.发明申请公开(公告)号：US20170176860A1
公开(公告)日：2017-06-22
申请号：US14978232
申请日：2015-12-22
发明人： Huirong Yao , M. Dalil Rahman , Douglas McKenzie , JoonYeon Cho
摘要： Compositions having a high metal content comprising a metal salt solution, a stabilizer and one or more optional additives, wherein the metal salt solution comprises a metal ion, a counter ion and a solvent. The compositions are useful for forming films on substrates in the manufacture of solid state and integrated circuit devices.
-
公开(公告)号：US20170176856A1
公开(公告)日：2017-06-22
申请号：US14976498
申请日：2015-12-21
发明人： Chunwei Chen , Weihong Liu , Ping-Hung Lu
CPC分类号： G03F7/038 , G03F7/0035 , G03F7/0048 , G03F7/027 , G03F7/031 , G03F7/033 , G03F7/0382 , G03F7/095 , G03F7/16 , G03F7/162 , G03F7/168 , G03F7/2004 , G03F7/2006 , G03F7/2022 , G03F7/2024 , G03F7/2053 , G03F7/322
摘要： A composition crosslinkable by broad band UV radiation, which after cross-linking is capable of cold ablation by a UV Excimer Laser emitting between 222 nm and 308 nm, where the composition is comprised of a negative tone resist developable in aqueous base comprising and is also comprised of a conjugated aryl additive absorbing ultraviolet radiation strongly in a range between from about 220 nm to about 310 nm.The present invention also encompasses a process comprising steps a), b) and c) a) coating the composition of claim 1 on a substrate; b) cross-linking the entire coating by irradiation with broadband UV exposure; c) forming a pattern in the cross-linked coating by cold laser ablating with a UV excimer laser emitting between 222 nm and 308 nm. Finally the present invention also encompasses The present invention also encompasses a process comprising steps a′), b′) c′) and d′) a) coating the composition of claim 1 on a substrate; b) cross-linking part of the coating by irradiation with broadband UV exposure through a mask; c) developing the coating with aqueous base removing the unexposed areas of the film, thereby forming a first pattern; d) forming a second pattern in the first pattern by laser cold laser ablating of the first pattern with a UV excimer laser emitting between 222 nm and 308 nm.
-
9.发明申请METAL HARDMASK COMPOSITION AND PROCESSES FOR FORMING FINE PATTERNS ON SEMICONDUCTOR SUBSTRATES 有权用于在半导体基板上形成精细图案的金属HARDMASK组合物和工艺公开(公告)号：US20160230019A1
公开(公告)日：2016-08-11
申请号：US14619603
申请日：2015-02-11
IPC分类号： C09D5/00 , G03F7/11 , H01L21/02 , H01L21/308 , H01L21/311
CPC分类号： C09D5/006 , G03F7/11 , H01L21/02142 , H01L21/02172 , H01L21/02175 , H01L21/02282 , H01L21/3081 , H01L21/3086 , H01L21/31133 , H01L21/31138
摘要： The present invention relates to a novel composition with improved stability containing soluble, multi-ligand-substituted metal compound, a polyol compound and a solvent useful for filling material on photoresist patterns with good trench or via filling properties of microlithographic features, where the filled patterns having good plasma etch resistance in oxygen based plasmas and are used as a hard mask in forming fine patterns on semiconductor substrates by pattern transfer of this hard mask. The present invention further relates to using the novel composition in methods for manufacturing electronic devices.
摘要翻译： 本发明涉及具有改进稳定性的新型组合物，其含有可溶性，多配位体取代的金属化合物，多元醇化合物和可用于在光刻胶图案上填充材料的溶剂，具有良好的沟槽或通过微光刻特征的通孔填充特性，其中填充图案 在氧基等离子体中具有良好的等离子体蚀刻电阻，并且用作通过该硬掩模的图案转印在半导体衬底上形成精细图案的硬掩模。 本发明还涉及在制造电子器件的方法中使用该组合物。
-
10.发明申请COMPOSITE OF METAL OXIDE NANOPARTICLES AND SILSESQUIOXANE POLYMER, METHOD FOR PRODUCING SAME, AND COMPOSITE MATERIAL PRODUCED USING COMPOSITE THEREOF 有权金属氧化物纳米颗粒和硅烷聚合物的组合物，其生产方法和使用它们的复合材料生产的复合材料公开(公告)号：US20150329679A1
公开(公告)日：2015-11-19
申请号：US14652666
申请日：2013-12-19
发明人： Naofumi YOSHIDA , Yuji TASHIRO , Daishi YOKOYAMA , Yasuaki TANAKA , Takashi FUKE , Megumi TAKAHASHI , Toshiaki NONAKA
IPC分类号： C08G77/398 , C08G77/06
CPC分类号： C08G77/398 , B82Y30/00 , C08G77/045 , C08G77/06 , C08G77/08 , C08G77/16 , C08G77/58 , C08G79/00 , C08K3/22 , C08K2201/005 , C08K2201/011 , C08L83/04 , C08L83/06 , C09D183/04
摘要： [Problem] An object of the present invention is to provide a composite of metal oxide nanoparticles and a silsesquioxane polymer, which can form a high-quality cured film wherein aggregation and the like of metal oxide do not occur during a curing process and the metal oxide is uniformly dispersed.[Means for Solution] Provided are: a method of producing a composite of metal oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal, or a silane monomer with metal oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in an aqueous solvent in the presence of a phase transfer catalyst; and a composite produced by the method.
摘要翻译： 本发明的目的是提供一种金属氧化物纳米粒子和倍半硅氧烷聚合物的复合体，其可以形成高质量的固化膜，其中在固化过程中金属氧化物的聚集等不会发生，并且金属 氧化物均匀分散。 [解决方案]提供了一种金属氧化物纳米粒子和倍半硅氧烷聚合物的复合体的制造方法，其特征在于，使末端具有硅烷醇基的倍半硅氧烷聚合物或硅烷单体与具有羟基的金属氧化物纳米粒子 或在相转移催化剂存在下在水性溶剂中的表面上的烷氧基; 和通过该方法制备的复合材料。
-
-
-
-
-
-
-
-
-
搜索结果
120 条记录 (耗时 0.026 秒)
