Invention Grant
US09293302B2 Method for processing a gas and a device for performing the method
有权
用于处理气体的方法和用于执行该方法的装置
- Patent Title: Method for processing a gas and a device for performing the method
- Patent Title (中): 用于处理气体的方法和用于执行该方法的装置
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Application No.: US14180981Application Date: 2014-02-14
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Publication No.: US09293302B2Publication Date: 2016-03-22
- Inventor: Philip John Risby , Dale Pennington
- Applicant: GasPlas AS
- Applicant Address: NO Oslo
- Assignee: GasPlas AS
- Current Assignee: GasPlas AS
- Current Assignee Address: NO Oslo
- Agency: Osha Liang LLP
- Priority: GB1107130.5 20110428
- Main IPC: H01J25/50
- IPC: H01J25/50 ; H01J37/32
Abstract:
A method and device for processing a gas by forming microwave plasmas of the gas. The gas that is to be processed is set in a two or three co-axial vortex flow inside the device and exposed to a microwave field to form the plasma in the inner co-axial vortex flow, which subsequently is expelled as a plasma afterglow through an outlet of the device.
Public/Granted literature
- US20140159572A1 METHOD FOR PROCESSING A GAS AND A DEVICE FOR PERFORMING THE METHOD Public/Granted day:2014-06-12
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