公开(公告)号：US09293302B2

公开(公告)日：2016-03-22

申请号：US14180981

申请日：2014-02-14

Applicant: GasPlas AS

Inventor： Philip John Risby ,  Dale Pennington

IPC: H01J25/50 ,  H01J37/32

CPC classification number: H01J37/32449 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/32357 ,  H05H1/30 ,  H05H1/34 ,  H05H1/46 ,  H05H2001/3478 ,  H05H2001/4622

Abstract: A method and device for processing a gas by forming microwave plasmas of the gas. The gas that is to be processed is set in a two or three co-axial vortex flow inside the device and exposed to a microwave field to form the plasma in the inner co-axial vortex flow, which subsequently is expelled as a plasma afterglow through an outlet of the device.

Abstract translation: 一种通过形成气体的微波等离子体来处理气体的方法和装置。 要处理的气体被设置在装置内部的两个或三个同轴涡流中并暴露于微波场以在内部同轴涡流中形成等离子体，其随后被排出为等离子体余辉 设备的出口。

公开(公告)号：US20140159572A1

公开(公告)日：2014-06-12

申请号：US14180981

申请日：2014-02-14

Applicant: GasPlas AS

Inventor： Philip John Risby ,  Dale Pennington

IPC: H01J37/32

CPC classification number: H01J37/32449 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/32357 ,  H05H1/30 ,  H05H1/34 ,  H05H1/46 ,  H05H2001/3478 ,  H05H2001/4622

Abstract: A method and device for processing a gas by forming microwave plasmas of the gas. The gas that is to be processed is set in a two or three co-axial vortex flow inside the device and exposed to a microwave field to form the plasma in the inner co-axial vortex flow, which subsequently is expelled as a plasma afterglow through an outlet of the device.

Abstract translation: 一种通过形成气体的微波等离子体来处理气体的方法和装置。 要处理的气体被设置在装置内部的两个或三个同轴涡流中并暴露于微波场以在内部同轴涡流中形成等离子体，其随后被排出为等离子体余辉 设备的出口。