Invention Grant
US09293926B2 Plasma processing systems having multi-layer segmented electrodes and methods therefor
有权
具有多层分段电极的等离子体处理系统及其方法
- Patent Title: Plasma processing systems having multi-layer segmented electrodes and methods therefor
- Patent Title (中): 具有多层分段电极的等离子体处理系统及其方法
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Application No.: US13689679Application Date: 2012-11-29
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Publication No.: US09293926B2Publication Date: 2016-03-22
- Inventor: Andreas Fischer , Dave Jacob
- Applicant: LAM RESEARCH CORPORATION
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H02J4/00 ; B44C1/22 ; H01J37/32

Abstract:
Methods and apparatus for plasma processing of a substrate to improve process results are proposed. The apparatus pertains to multi-layer segmented electrodes and methods to form and operate such electrodes. The multi-layer segmented electrode includes a first layer comprising a first plurality of electrode segments, whereby electrode segments of the first plurality of electrode segments spatially separated from one another along a first direction. There is also included a second layer comprising a second plurality of electrode segments, whereby the second layer is spatially separated from the first layer along a second direction perpendicular to the first direction and whereby at least two segmented electrodes of the first plurality of electrode segments are individually controllable with respect to one or more electrical parameters.
Public/Granted literature
- US20140139049A1 PLASMA PROCESSING SYSTEMS HAVING MULTI-LAYER SEGMENTED ELECTRODES AND METHODS THEREFOR. Public/Granted day:2014-05-22
Information query
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