Invention Grant
US09298946B2 Physically unclonable function based on breakdown voltage of metal-insulator-metal device
有权
基于金属绝缘体金属器件击穿电压的物理不可克隆功能
- Patent Title: Physically unclonable function based on breakdown voltage of metal-insulator-metal device
- Patent Title (中): 基于金属绝缘体金属器件击穿电压的物理不可克隆功能
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Application No.: US14072735Application Date: 2013-11-05
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Publication No.: US09298946B2Publication Date: 2016-03-29
- Inventor: Xiaochun Zhu , Steven M. Millendorf , Xu Guo , David M. Jacobson , Kangho Lee , Seung H. Kang , Matthew Michael Nowak
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Agency: Loza & Loza, LLP
- Main IPC: G11C17/02
- IPC: G11C17/02 ; G06F21/70 ; G06F1/26 ; G11C11/16 ; H04L9/08 ; H04L9/32 ; G09C1/00

Abstract:
One feature pertains to a method of implementing a physically unclonable function that includes providing an array of metal-insulator-metal (MIM) devices, where the MIM devices are configured to represent a first resistance state or a second resistance state and a plurality of the MIM devices are initially at the first resistance state. The MIM devices have a random breakdown voltage that is greater than a first voltage and less than a second voltage, where the breakdown voltage represents a voltage that causes the MIM devices to transition from the first resistance state to the second resistance state. The method further includes applying a signal line voltage to the MIM devices to cause a portion of the MIM devices to randomly breakdown and transition from the first resistance state to the second resistance state, the signal line voltage greater than the first voltage and less than the second voltage.
Public/Granted literature
- US20150074433A1 PHYSICALLY UNCLONABLE FUNCTION BASED ON BREAKDOWN VOLTAGE OF METAL- INSULATOR-METAL DEVICE Public/Granted day:2015-03-12
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