发明授权
- 专利标题: Semiconductor device cleaning method and apparatus
- 专利标题(中): 半导体器件清洗方法及装置
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申请号: US13210998申请日: 2011-08-16
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公开(公告)号: US09299593B2公开(公告)日: 2016-03-29
- 发明人: Ming-Hsi Yeh , Kuo-Sheng Chuang , Ying-Hsueh Chang Chien , Chi-Ming Yang , Chin-Hsiang Lin
- 申请人: Ming-Hsi Yeh , Kuo-Sheng Chuang , Ying-Hsueh Chang Chien , Chi-Ming Yang , Chin-Hsiang Lin
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Haynes and Boone, LLP
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L21/67 ; B08B3/02
摘要:
A method includes providing a wafer and providing a first spray bar spaced a distance from the wafer. A first spray is dispensed from the first spray bar onto a first portion (e.g., half) of the wafer. Thereafter, the wafer is rotated. A second spray is dispensed from the first spray bar onto a second portion (e.g., half) of the rotated wafer. In embodiments, a plurality of spray bars are positioned above the wafer. One or more of the spray bars may be tunable in separation distance and/or angle of dispensing.
公开/授权文献
- US20130045606A1 SEMICONDUCTOR DEVICE CLEANING METHOD AND APPARATUS 公开/授权日:2013-02-21
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