Invention Grant
- Patent Title: Semiconductor device cleaning method and apparatus
- Patent Title (中): 半导体器件清洗方法及装置
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Application No.: US13210998Application Date: 2011-08-16
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Publication No.: US09299593B2Publication Date: 2016-03-29
- Inventor: Ming-Hsi Yeh , Kuo-Sheng Chuang , Ying-Hsueh Chang Chien , Chi-Ming Yang , Chin-Hsiang Lin
- Applicant: Ming-Hsi Yeh , Kuo-Sheng Chuang , Ying-Hsueh Chang Chien , Chi-Ming Yang , Chin-Hsiang Lin
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/67 ; B08B3/02

Abstract:
A method includes providing a wafer and providing a first spray bar spaced a distance from the wafer. A first spray is dispensed from the first spray bar onto a first portion (e.g., half) of the wafer. Thereafter, the wafer is rotated. A second spray is dispensed from the first spray bar onto a second portion (e.g., half) of the rotated wafer. In embodiments, a plurality of spray bars are positioned above the wafer. One or more of the spray bars may be tunable in separation distance and/or angle of dispensing.
Public/Granted literature
- US20130045606A1 SEMICONDUCTOR DEVICE CLEANING METHOD AND APPARATUS Public/Granted day:2013-02-21
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