Invention Grant
- Patent Title: Hard-mask defined bit pattern substrate
- Patent Title (中): 硬掩模定义的位图案衬底
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Application No.: US14339052Application Date: 2014-07-23
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Publication No.: US09299609B2Publication Date: 2016-03-29
- Inventor: XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , Zhaoning Yu , Kim Y. Lee , David S. Kuo
- Applicant: SEAGATE TECHNOLOGY LLC
- Applicant Address: US CA Cupertino
- Assignee: Seagate Technology LLC
- Current Assignee: Seagate Technology LLC
- Current Assignee Address: US CA Cupertino
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01R31/26 ; H01L21/768
Abstract:
Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
Public/Granted literature
- US20160027681A1 HARD-MASK DEFINED BIT PATTERN SUBSTRATE Public/Granted day:2016-01-28
Information query
IPC分类:
