Invention Grant
- Patent Title: Vertical transistor component
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Application No.: US14682755Application Date: 2015-04-09
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Publication No.: US09299829B2Publication Date: 2016-03-29
- Inventor: Andreas Peter Meiser , Markus Zundel , Christoph Kadow
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/00
- IPC: H01L29/00 ; H01L29/78 ; H01L29/66 ; H01L29/06 ; H01L29/423 ; H01L29/739 ; H01L21/8234 ; H01L27/088 ; H01L29/40 ; H01L29/417

Abstract:
A vertical transistor component includes a semiconductor body with first and second surfaces, a drift region, and a source region and body region arranged between the drift region and the first surface. The body region is also arranged between the source region and the drift region. The vertical transistor component further includes a gate electrode arranged adjacent to the body zone, a gate dielectric arranged between the gate electrode and the body region, and a drain region arranged between the drift region and the second surface. A source electrode electrically contacts the source region, is electrically insulated from the gate electrode and arranged on the first surface. A drain electrode electrically contacts the drain region and is arranged on the second surface. A gate contact electrode is electrically insulated from the semiconductor body, extends in the semiconductor body to the second surface, and is electrically connected with the gate electrode.
Public/Granted literature
- US20150214357A1 Vertical Transistor Component Public/Granted day:2015-07-30
Information query
IPC分类: