A transparent conductive film 1 includes: a substrate film 11 composed of a transparent resin; a high refractive index coat layer 12 formed on a surface of the substrate film 11, and having an optical refractive index higher than that of the substrate film 11; a low refractive index coat layer 13 formed on a surface of the high refractive index coat layer 12, and having an optical refractive index lower than that of the high refractive index coat layer 12; a moisture-proof underlying layer 14 formed on a surface of the low refractive index coat layer 13 and composed of silicon oxide; and a transparent wiring layer 15 patterned on a surface of the underlying layer 14 and composed of crystalline ITO having an optical refractive index higher than the underlying layer 14. The crystallite size of ITO in the transparent wiring layer 15 is 9 nm or less.