Invention Grant
US09311442B2 Net-voltage-aware optical proximity correction (OPC) 有权
净电压感知光学邻近校正(OPC)

Net-voltage-aware optical proximity correction (OPC)
Abstract:
Various embodiments include computer-implemented methods, computer program products and systems for verifying an integrated circuit (IC) layout. In some cases, approaches include a computer-implemented method of verifying an IC layout, the method including: obtaining data about a process variation band for at least one physical feature in the IC layout; determining voltage-based process variation band thresholds for the at least one physical feature in the IC layout; determining whether the process variation band for the at least one physical feature in the IC layout meets design specifications for the IC layout based upon the voltage-based process variation band thresholds for the at least one physical feature in the IC layout; and modifying the IC layout in response to a determination that the process variation band for the at least one physical feature does not meet the design specifications.
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