Invention Grant
US09335629B2 Self-assembly of block copolymers on topographically patterned polymeric substrates
有权
嵌段共聚物在地形图案聚合物基材上的自组装
- Patent Title: Self-assembly of block copolymers on topographically patterned polymeric substrates
- Patent Title (中): 嵌段共聚物在地形图案聚合物基材上的自组装
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Application No.: US13546378Application Date: 2012-07-11
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Publication No.: US09335629B2Publication Date: 2016-05-10
- Inventor: Thomas P. Russell , Soojin Park , Dong Hyun Lee , Ting Xu
- Applicant: Thomas P. Russell , Soojin Park , Dong Hyun Lee , Ting Xu
- Applicant Address: US MA Boston US CA Oakland
- Assignee: THE UNIVERSITY OF MASSACHUSETTS,THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
- Current Assignee: THE UNIVERSITY OF MASSACHUSETTS,THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
- Current Assignee Address: US MA Boston US CA Oakland
- Agency: Cantor Colburn LLP
- Main IPC: B05D3/00
- IPC: B05D3/00 ; G03F7/00 ; B81C1/00 ; B82Y10/00 ; B82Y40/00
Abstract:
Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.
Public/Granted literature
- US20120276346A1 SELF-ASSEMBLY OF BLOCK COPOLYMERS ON TOPOGRAPHICALLY PATTERNED POLYMERIC SUBSTRATES Public/Granted day:2012-11-01
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