Invention Grant
- Patent Title: Multi charged particle beam writing apparatus and multi charged particle beam writing method
- Patent Title (中): 多带电粒子束写入装置和多带电粒子束写入方法
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Application No.: US14662612Application Date: 2015-03-19
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Publication No.: US09336994B2Publication Date: 2016-05-10
- Inventor: Yasuo Kato
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-033303 20110218
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/317 ; G03F1/78 ; H01J37/302 ; B82Y10/00 ; B82Y40/00

Abstract:
A charged particle beam writing apparatus includes a storage unit to store each pattern data of plural figure patterns arranged in each of plural small regions made by virtually dividing a writing region of a target workpiece to be written on which resist being coated. The charged particle beam writing apparatus further including an assignment unit to assign each pattern data of each figure pattern to be arranged in each of the plural small regions concerned, and a writing unit to write, for each of plural groups, each figure pattern in each of the plural small regions concerned by using a charged particle beam.
Public/Granted literature
- US20150194289A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2015-07-09
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