Invention Grant
US09337210B2 Vertical ferroelectric field effect transistor constructions, constructions comprising a pair of vertical ferroelectric field effect transistors, vertical strings of ferroelectric field effect transistors, and vertical strings of laterally opposing pairs of vertical ferroelectric field effect transistors
有权
垂直铁电场效应晶体管结构,包括一对垂直铁电场效应晶体管的结构,铁电场效应晶体管的垂直串和横向相对的垂直铁电场效应晶体管的垂直串
- Patent Title: Vertical ferroelectric field effect transistor constructions, constructions comprising a pair of vertical ferroelectric field effect transistors, vertical strings of ferroelectric field effect transistors, and vertical strings of laterally opposing pairs of vertical ferroelectric field effect transistors
- Patent Title (中): 垂直铁电场效应晶体管结构,包括一对垂直铁电场效应晶体管的结构,铁电场效应晶体管的垂直串和横向相对的垂直铁电场效应晶体管的垂直串
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Application No.: US13964309Application Date: 2013-08-12
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Publication No.: US09337210B2Publication Date: 2016-05-10
- Inventor: Kamal M. Karda , Chandra Mouli , Gurtej S. Sandhu
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John, P.S.
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L21/02 ; H01L21/28 ; H01L29/51 ; H01L29/66 ; G11C11/22

Abstract:
A vertical ferroelectric field effect transistor construction comprises an isolating core. A transition metal dichalcogenide material encircles the isolating core and has a lateral wall thickness of 1 monolayer to 7 monolayers. A ferroelectric gate dielectric material encircles the transition metal dichalcogenide material. Conductive gate material encircles the ferroelectric gate dielectric material. The transition metal dichalcogenide material extends elevationally inward and elevationally outward of the conductive gate material. A conductive contact is directly against a lateral outer sidewall of the transition metal dichalcogenide material that is a) elevationally inward of the conductive gate material, or b) elevationally outward of the conductive gate material. Additional embodiments are disclosed.
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