Invention Grant
- Patent Title: Extreme ultraviolet light source
- Patent Title (中): 极紫外光源
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Application No.: US14563496Application Date: 2014-12-08
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Publication No.: US09338870B2Publication Date: 2016-05-10
- Inventor: Yezheng Tao , John Tom Stewart, IV , Daniel J.W. Brown
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G21K5/00

Abstract:
A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining plasma and the initial target interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target including the target material arranged in the shaped spatial distribution; an amplified light beam is directed toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light; and a second remaining plasma is formed in the target region.
Public/Granted literature
- US20150189728A1 Extreme Ultraviolet Light Source Public/Granted day:2015-07-02
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