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Patent Agency Ranking
公开(公告)号：US20140299791A1
公开(公告)日：2014-10-09
申请号：US14310972
申请日：2014-06-20
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J.W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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公开(公告)号：US20150250045A1
公开(公告)日：2015-09-03
申请号：US14194027
申请日：2014-02-28
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel J.W. Brown , Alexander Schafgans , Michael David Caudill , Daniel J. Golich , Richard L. Sandstrom , Yoshiho Amada
CPC classification number: H05G2/008 , H01S3/1003 , H01S3/1301 , H01S3/1305 , H05G2/003
Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.
Abstract translation: 一种用于极紫外（EUV）光源的系统包括光放大器，其包括位于光束路径上的增益介质，所述光放大器被配置为在输入处接收光束并且向EUV光源发射输出光束 输出 反馈系统，其测量输出光束的性质并基于测量的属性产生反馈信号; 以及位于所述光束路径中并被配置为接收所述反馈信号并响应于所述反馈信号调整所述输出光束的特性的自适应光学器件。
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公开(公告)号：US09338870B2
公开(公告)日：2016-05-10
申请号：US14563496
申请日：2014-12-08
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Daniel J.W. Brown
Abstract: A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining plasma and the initial target interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target including the target material arranged in the shaped spatial distribution; an amplified light beam is directed toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light; and a second remaining plasma is formed in the target region.
Abstract translation: 形成与目标区域至少部分重合的第一剩余等离子体; 提供了包括在目标区域的第一空间分布中的目标材料的目标，所述目标材料包括当转换成等离子体时发射EUV光的材料; 所述第一剩余等离子体和所述初始靶相互作用，所述相互作用将所述目标材料从所述第一空间分布重新排列成成形目标分布，以在所述目标区域中形成成形目标，所述成形靶包括布置在所述成形空间分布中的所述目标材料; 放大的光束被引向目标区域，以将成形靶中的目标材料中的至少一些转换成发射EUV光的等离子体; 并且在目标区域中形成第二剩余等离子体。
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公开(公告)号：US20150076374A1
公开(公告)日：2015-03-19
申请号：US14550421
申请日：2014-11-21
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J.W. Brown , Daniel J. Golich
IPC: H05G2/00
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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公开(公告)号：US20150189728A1
公开(公告)日：2015-07-02
申请号：US14563496
申请日：2014-12-08
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Daniel J.W. Brown
IPC: H05G2/00
Abstract: A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining plasma and the initial target interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target including the target material arranged in the shaped spatial distribution; an amplified light beam is directed toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light; and a second remaining plasma is formed in the target region.
Abstract translation: 形成与目标区域至少部分重合的第一剩余等离子体; 提供了包括在目标区域的第一空间分布中的目标材料的目标，所述目标材料包括当转换成等离子体时发射EUV光的材料; 所述第一剩余等离子体和所述初始靶相互作用，所述相互作用将所述目标材料从所述第一空间分布重新排列成成形目标分布，以在所述目标区域中形成成形目标，所述成形靶包括布置在所述成形空间分布中的所述目标材料; 放大的光束被引向目标区域，以将成形靶中的目标材料中的至少一些转换成发射EUV光的等离子体; 并且在目标区域中形成第二剩余等离子体。
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