Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US14356124Application Date: 2012-11-14
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Publication No.: US09341960B2Publication Date: 2016-05-17
- Inventor: Antonius Johannes Josephus Van Dijsseldonk , Arno Jan Bleeker
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2012/072559 WO 20121114
- International Announcement: WO2013/083371 WO 20130613
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20 ; G02B27/12

Abstract:
An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.
Public/Granted literature
- US20140285782A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2014-09-25
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