Invention Grant
- Patent Title: Chemistry compatible coating material for advanced device on-wafer particle performance
- Patent Title (中): 化学相容涂层材料，用于先进的晶片颗粒性能
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Application No.: US13830608Application Date: 2013-03-14
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Publication No.: US09343289B2Publication Date: 2016-05-17
- Inventor: Jennifer Y. Sun , Biraja Prasad Kanungo , Dmitry Lubomirsky
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: C23C4/10
- IPC: C23C4/10 ; H01L21/02 ; H01J37/32 ; C04B41/87 ; C04B41/00 ; C04B41/50
Abstract:
To manufacture a coating for an article for a semiconductor processing chamber, the article including a body of at least one of Al, Al2O3, or SiC, and a ceramic coating on the body. The ceramic coating includes a compound comprising Y2O3 in a range from about 50 mol % to about 75 mol %, ZrO2 in a range from about 10 mol % to about 30 mol %, and Al2O3 in a range from about 10 mol % to about 30 mol %, wherein the number of nodules per inch is in a range from about 30 nodules to about 45 nodules and the porosity is in a range from about 2.5% to about 3.2%.
Public/Granted literature
- US20140030486A1 CHEMISTRY COMPATIBLE COATING MATERIAL FOR ADVANCED DEVICE ON-WAFER PARTICLE PERFORMANCE Public/Granted day:2014-01-30
Information query
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