发明授权
US09343656B2 Magnetic tunnel junction (MTJ) structure in magnetic random access memory
有权
磁性随机存取存储器中的磁隧道结(MTJ)结构
- 专利标题: Magnetic tunnel junction (MTJ) structure in magnetic random access memory
- 专利标题(中): 磁性随机存取存储器中的磁隧道结(MTJ)结构
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申请号: US13410714申请日: 2012-03-02
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公开(公告)号: US09343656B2公开(公告)日: 2016-05-17
- 发明人: Kai-Wen Cheng , Chwen Yu , Chih-Ming Chen
- 申请人: Kai-Wen Cheng , Chwen Yu , Chih-Ming Chen
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Slater Matsil, LLP
- 主分类号: H01L29/82
- IPC分类号: H01L29/82 ; H01L43/08
摘要:
Methods and apparatuses for a magnetic tunnel junction (MTJ) which can be used in as a magnetic random access memory cell are disclosed. The MTJ comprises a free layer and an insulator layer. The MTJ further comprises a pinned layer with a first region, a second region, and a third region. The second region is of a first length and of a first thickness, and the first region and the third region are of a second length and of a second thickness. A ratio of the first thickness to the second thickness may be larger than 1.2. A ratio of the second length to the first length is larger than 0.5. The first thickness may be larger than a spin diffusion length of a material for the pinned layer. So formed MTJ results in increased tunneling magnetic resistance ratio and reduced critical switch current of the MTJ.
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