Invention Grant
- Patent Title: Wafer and reticle inspection systems and methods for selecting illumination pupil configurations
- Patent Title (中): 晶圆和掩模版检查系统和选择照明瞳孔配置的方法
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Application No.: US14381315Application Date: 2013-03-01
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Publication No.: US09347891B2Publication Date: 2016-05-24
- Inventor: Grace H. Chen , Rudolf Brunner , Lisheng Gao , Robert M. Danen , Lu Chen
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Kwan & Olynick LLP
- International Application: PCT/US2013/028650 WO 20130301
- International Announcement: WO2013/134068 WO 20130912
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/88 ; G01N21/956

Abstract:
In an optical inspection tool, an illumination aperture is opened at each of a plurality of aperture positions of an illumination pupil area one at a time across the illumination pupil area. For each aperture opening position, an incident beam is directed towards the illumination pupil area so as to selectively pass a corresponding ray bundle of the illumination beam at a corresponding set of one or more incident angles towards the sample and an output beam, which is emitted from the sample in response to the corresponding ray bundle of the incident beam impinging on the sample at the corresponding set of one or more incident angles, is detected. A defect detection characteristic for each aperture position is determined based on the output beam detected for each aperture position. An optimum aperture configuration is determined based on the determined defect detection characteristic for each aperture position.
Public/Granted literature
- US20150015874A1 WAFER AND RETICLE INSPECTION SYSTEMS AND METHODS FOR SELECTING ILLUMINATION PUPIL CONFIGURATIONS Public/Granted day:2015-01-15
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