Invention Grant
- Patent Title: Semiconductor device
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Application No.: US14807559Application Date: 2015-07-23
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Publication No.: US09362262B2Publication Date: 2016-06-07
- Inventor: Shintaro Yamamichi , Manabu Okamoto , Hirokazu Honda
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Tokyo
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Tokyo
- Agency: Shapiro, Gabor and Rosenberger, PLLC
- Priority: JP2013-120013 20130606
- Main IPC: H01L23/04
- IPC: H01L23/04 ; H01L23/34 ; H01L23/52 ; H01L21/44 ; H01L25/18 ; H01L23/498 ; H01L23/48 ; H01L23/31 ; H01L23/50 ; H01L21/56 ; H01L25/065 ; H01L23/00 ; H01L25/00 ; H01L23/12 ; H01L23/367

Abstract:
This invention prevents a substrate of a semiconductor chip that has through-silicon vias collectively arranged in a specific area thereof from becoming cracked. When a direction in parallel with a long side of a first semiconductor chip is defined as a row direction and a direction perpendicular to the long side of the first semiconductor chip is defined as a column direction, each one of the first through-silicon vias is arranged on any one of grid points arranged in m rows and n columns (m>n). In addition, as viewed in a cross section taken along a short side of the first semiconductor chip, the center of a through-silicon via area, which is defined by coupling the outermost grid points arranged in m rows and n columns, is off center of the short side of the first semiconductor chip in a first direction.
Public/Granted literature
- US20150333048A1 SEMICONDUCTOR DEVICE Public/Granted day:2015-11-19
Information query
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