Invention Grant
- Patent Title: Semiconductor memory devices including fine patterns and methods of fabricating the same
- Patent Title (中): 包括精细图案的半导体存储器件及其制造方法
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Application No.: US14681505Application Date: 2015-04-08
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Publication No.: US09362303B2Publication Date: 2016-06-07
- Inventor: Jaegoo Lee , Youngwoo Park , Jaeduk Lee
- Applicant: Jaegoo Lee , Youngwoo Park , Jaeduk Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel & Sibley
- Priority: KR10-2014-0042418 20140409
- Main IPC: H01L29/792
- IPC: H01L29/792 ; H01L27/115 ; H01L29/66 ; H01L21/28 ; H01L21/768 ; H01L21/285

Abstract:
Semiconductor devices are provided including an active pillar protruding from a substrate; a first gate electrode and a second gate electrode adjacent to a sidewall of the active pillar and vertically overlapping with each other, the first and second gate electrodes being insulated from each other; a first intergate insulating layer covering a first surface of the first gate electrode; and a second intergate insulating layer covering a second surface, opposite the first surface, of the second gate electrode and spaced apart from the first intergate insulating layer. The first intergate insulating layer and the second intergate insulating layer define an air gap therebetween.
Public/Granted literature
- US20150294980A1 Semiconductor Memory Devices Including Fine Patterns and Methods of Fabricatring the Same Public/Granted day:2015-10-15
Information query
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