Invention Grant
- Patent Title: Photoresist monomer, photoresist and method for the preparation thereof, color filter
- Patent Title (中): 光阻单体，光刻胶及其制备方法，滤色片
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Application No.: US14381746Application Date: 2013-12-13
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Publication No.: US09365505B2Publication Date: 2016-06-14
- Inventor: Xuelan Wang , Chen Tang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD
- Current Assignee Address: CN Beijing
- Agency: Collard & Roe, P.C.
- Priority: CN201310302391 20130715
- International Application: PCT/CN2013/089332 WO 20131213
- International Announcement: WO2015/007049 WO 20150122
- Main IPC: G03F7/027
- IPC: G03F7/027 ; G03F7/031 ; G02B5/20 ; C07C309/73 ; G03F7/00 ; G03F7/004 ; C07C303/26 ; G02B5/22
Abstract:
A photoresist monomer, a photoresist and a method for the preparation thereof, a color filter. The photoresist monomer has a structure represented by Formula I, wherein, R1 is hydrogen or methyl; R2 is hydrogen, methyl, ethyl, or propyl; R3 is hydrogen or C1-6 alkyl; and n is from 1 to 4. The resulting photoresist exhibits a compact and smooth surface and a gentle angle of slope.
Public/Granted literature
- US20160009641A1 PHOTORESIST MONOMER, PHOTORESIST AND METHOD FOR THE PREPARATION THEREOF, COLOR FILTER Public/Granted day:2016-01-14
Information query
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