Invention Grant
- Patent Title: Ion source, ion gun, and analysis instrument
- Patent Title (中): 离子源,离子枪和分析仪
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Application No.: US14600338Application Date: 2015-01-20
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Publication No.: US09372161B2Publication Date: 2016-06-21
- Inventor: Daisuke Sakai , Mauo Sogou , Kenzo Hiraoka
- Applicant: ULVAC-PHI, Inc.
- Applicant Address: JP Chigasaki-shi
- Assignee: ULVAC-PHI, INC.
- Current Assignee: ULVAC-PHI, INC.
- Current Assignee Address: JP Chigasaki-shi
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2014-009699 20140122
- Main IPC: G01N23/02
- IPC: G01N23/02 ; H01J49/26 ; H01J37/08 ; H01J37/252 ; H01J27/26 ; H01J49/04 ; H01J49/16 ; G01N23/225

Abstract:
Provided are an ion source, an ion gun, and an analysis instrument, which are capable of performing sputtering without damage to a surface of a sample and improving detection sensitivity in mass spectroscopy. In the ion source, an emission opening to which ionization liquid is supplied is disposed in an electric field formed in vacuum environment by an extracting electrode so that super large droplet cluster ions are generated from the emission opening. When the sample is irradiated with a super large droplet cluster ion beam, the sample surface is subjected to sputtering without damage, so as to remove contamination substances or to expose a new surface of the sample. In mass spectroscopy, detection sensitivity is improved.
Public/Granted literature
- US20150206732A1 ION SOURCE, ION GUN, AND ANALYSIS INSTRUMENT Public/Granted day:2015-07-23
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