Invention Grant
- Patent Title: Memory device and method for fabricating the same
- Patent Title (中): 存储器件及其制造方法
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Application No.: US14604116Application Date: 2015-01-23
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Publication No.: US09373629B1Publication Date: 2016-06-21
- Inventor: Shih-Guei Yan , Chih-Chieh Cheng , Wen-Jer Tsai
- Applicant: MACRONIX International Co., Ltd.
- Applicant Address: JP Hsinchu
- Assignee: MACRONIX International Co., Ltd.
- Current Assignee: MACRONIX International Co., Ltd.
- Current Assignee Address: JP Hsinchu
- Agency: J.C. Patents
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/76 ; H01L29/94 ; H01L31/113 ; H01L27/115 ; H01L23/535 ; H01L21/768

Abstract:
A memory device is provided. The memory device includes a plurality of stack structures, a plurality of first stepped contacts, and a plurality of second stepped contacts. Each of the stack structures extends in a first direction, and includes a first semiconductor layer and a second semiconductor layer. The second semiconductor layer is disposed above the first semiconductor layer. Each of the first stepped contacts extends in a second direction, and a bottom surface thereof is electrically connected to the first semiconductor layers of an i+1th stack structure and an i+2th stack structure, wherein i is an odd number. Each of the second stepped contacts extends in the second direction, and a bottom surface thereof is electrically connected to the second semiconductor layers of an nth stack structure and the i+1th stack structure. The first direction is different from the second direction.
Information query
IPC分类: