Invention Grant
- Patent Title: Method for manufacturing pattern using chemically amplified resist
- Patent Title (中): 使用化学放大抗蚀剂制造图案的方法
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Application No.: US14295463Application Date: 2014-06-04
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Publication No.: US09377687B2Publication Date: 2016-06-28
- Inventor: Jun Chun , Ji-Hyun Kim , Sung-Kyun Park , Jeong-Min Park , Jung-Soo Lee , Jin-Ho Ju
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2013-0149824 20131204
- Main IPC: G03F7/26
- IPC: G03F7/26 ; G03F7/039 ; H01L21/3213
Abstract:
A method of manufacturing a pattern includes forming a pattern material layer on a substrate, forming a protective layer on the pattern material layer, forming a resist layer on the protective layer, selectively exposing the resist layer to light, and developing the selectively exposed resist layer.
Public/Granted literature
- US20150155161A1 METHOD FOR MANUFACTURING PATTERN USING CHEMICALLY AMPLIFIED RESIST Public/Granted day:2015-06-04
Information query
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