Invention Grant
- Patent Title: Ultra high voltage electrostatic discharge protection device with current gain
- Patent Title (中): 具有电流增益的超高压静电放电保护装置
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Application No.: US14079715Application Date: 2013-11-14
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Publication No.: US09379179B2Publication Date: 2016-06-28
- Inventor: Hsin-Chih Chiang , Tung-Yang Lin , Ruey-Hsin Liu , Ming-Ta Lei
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW
- Agency: Hauptman Ham, LLP
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/66 ; H01L29/861 ; H01L27/02

Abstract:
A semiconductor device configured to provide increased current gain comprises a semiconductor substrate having a first conductivity type. The device also comprises a first semiconductor region having a second conductivity type. The device further comprises a second semiconductor region in the first semiconductor region to having the first conductivity type. The device additionally comprises a third semiconductor region in the first semiconductor region having the second conductivity type. The device also comprises a fourth semiconductor region outside the first semiconductor region having the first conductivity type. The device further comprises a fifth semiconductor region outside the first semiconductor region adjacent the fourth semiconductor region and having the second conductivity type. The device additionally comprises a first electrode electrically connected to the third semiconductor region. The device further comprises a second electrode electrically connected to the fourth semiconductor region and to the fifth semiconductor region.
Public/Granted literature
- US20150130032A1 ULTRA HIGH VOLTAGE ELECTROSTATIC DISCHARGE PROTECTION DEVICE WITH CURRENT GAIN Public/Granted day:2015-05-14
Information query
IPC分类: