Invention Grant
- Patent Title: Amorphous dielectric film and electronic component
- Patent Title (中): 非晶绝缘膜和电子元件
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Application No.: US14310212Application Date: 2014-06-20
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Publication No.: US09382163B2Publication Date: 2016-07-05
- Inventor: Toshihiko Kaneko , Saori Takeda , Yuki Yamashita , Junichi Yamazaki
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2013-129678 20130620; JP2014-068512 20140328
- Main IPC: C04B35/00
- IPC: C04B35/00 ; C04B35/49 ; H01L49/02

Abstract:
The present invention aims to provide an amorphous dielectric film and an electronic component in which the relative permittivity and the temperature coefficient of electrostatic capacitance can be maintained and the withstand voltage can be increased even if the dielectric film is further thinned. The amorphous dielectric film of the present invention is characterized in that it is a dielectric film composed of an amorphous composition with A-B—O as the main component, wherein A contains at least two elements selected from the group consisting of Ba, Ca and Sr, and B contains Zr. When the main component of the dielectric film is represented by (BaxCaySrz)α—B—O, x, y and z meet the conditions of 0≦x≦1, 0≦y≦1, 0≦z≦1, respectively, x+y+z=1 and at least any two of x, y and z are 0.1 or more. When A/B is represented by α, 0.5≦α≦1.5.
Public/Granted literature
- US20140378295A1 AMORPHOUS DIELECTRIC FILM AND ELECTRONIC COMPONENT Public/Granted day:2014-12-25
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