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US09385086B2 Bi-layer hard mask for robust metallization profile 有权
双层硬掩模,用于坚固的金属化轮廓

Bi-layer hard mask for robust metallization profile
Abstract:
A robust metallization profile is formed by forming two or more layers of hard mask with different density. Multi-layer metal hard mask is helpful especially in small feature size process, for example, 50 nm and below. Lower layers have higher density. In such ways, enough process window is offered by lower layers and at the same time, round hard mask profile is offered by upper layers.
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