Invention Grant
US09391156B2 Embedded capacitor 有权
嵌入式电容器

Embedded capacitor
Abstract:
A method of manufacturing a semiconductor device is provided, including forming a gate electrode of a dummy transistor device on a semiconductor substrate, forming a high-k material layer over and adjacent to the gate electrode and forming a metal layer on the high-k material layer over and adjacent to the gate electrode to form a capacitor.
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