Invention Grant
- Patent Title: Heterojunction bipolar transistors with intrinsic interlayers
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Application No.: US14725755Application Date: 2015-05-29
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Publication No.: US09391180B2Publication Date: 2016-07-12
- Inventor: Bahman Hekmatshoar-Tabari , Tak H. Ning , Devendra K. Sadana , Ghavam G. Shahidi , Davood Shahrjerdi
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/737 ; H01L21/02 ; H01L29/735 ; H01L29/16 ; H01L29/165 ; H01L21/265 ; H01L21/30 ; H01L29/08 ; H01L29/10 ; H01L29/36 ; H01L29/417 ; H01L29/423

Abstract:
Heterojunction bipolar transistors are provided that include at least one contact (e.g., collector, emitter, and/or base) formed by a heterojunction between a crystalline semiconductor material and a doped non-crystalline semiconductor material layer. An interfacial intrinsic non-crystalline semiconductor material layer is present at the heterojunction between the crystalline semiconductor material and the doped non-crystalline semiconductor material layer. The presence of the interfacial intrinsic non-crystalline semiconductor material layer improves the surface passivation of the crystalline semiconductor material by reducing the interface defect density at the heterojunction.
Public/Granted literature
- US20150263129A1 HETEROJUNCTION BIPOLAR TRANSISTORS WITH INTRINSIC INTERLAYERS Public/Granted day:2015-09-17
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