Invention Grant
US09396911B2 Determination method, control method, determination apparatus, pattern forming system and program
有权
确定方法，控制方法，确定装置，图案形成系统和程序
- Patent Title: Determination method, control method, determination apparatus, pattern forming system and program
- Patent Title (中): 确定方法，控制方法，确定装置，图案形成系统和程序
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Application No.: US13430905Application Date: 2012-03-27
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Publication No.: US09396911B2Publication Date: 2016-07-19
- Inventor: Keisuke Tanaka , Kazuo Sawai , Hiroshi Nagahata
- Applicant: Keisuke Tanaka , Kazuo Sawai , Hiroshi Nagahata
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2011-070947 20110328
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/3065
Abstract:
A determination method, a control method, a determination apparatus, a pattern forming system, and a storage medium can determine a replacement time of a focus ring accurately and quickly. The determination method is capable of determining the replacement time of a focus ring that surrounds a substrate to increase uniformity of a pattern in a surface of the substrate when the pattern is formed by etching a film on the substrate. The determination method includes measuring a shape or a critical dimension of the pattern; and determining the replacement time of the focus ring based on the measured shape or the measured critical dimension of the pattern.
Public/Granted literature
- US20120249986A1 DETERMINATION METHOD, CONTROL METHOD, DETERMINATION APPARATUS, PATTERN FORMING SYSTEM AND PROGRAM Public/Granted day:2012-10-04
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