Invention Grant
- Patent Title: Feature etching using varying supply of power pulses
- Patent Title (中): 使用改变的功率脉冲电源进行特征蚀刻
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Application No.: US14031563Application Date: 2013-09-19
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Publication No.: US09401263B2Publication Date: 2016-07-26
- Inventor: Xiang Hu , Gabriel Padron Wells , Jack Chao-Hsu Chang , Mingmei Wang , Taejoon Han
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Agent Kristian Ziegler
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/3065 ; H01L21/3213
Abstract:
Etching a feature of a structure by an etch system is facilitated by varying supply of radio frequency (RF) power pulses to the etch system. The varying provides at least one RF power pulse, of the supplied RF power pulses, that deviates from one or more other RF power pulses, of the supplied RF power pulses, by at least one characteristic.
Public/Granted literature
- US20150076111A1 FEATURE ETCHING USING VARYING SUPPLY OF POWER PULSES Public/Granted day:2015-03-19
Information query
