Invention Grant
- Patent Title: Method for compensating slit illumination uniformity
- Patent Title (中): 补偿狭缝照明均匀性的方法
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Application No.: US14277788Application Date: 2014-05-15
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Publication No.: US09411240B2Publication Date: 2016-08-09
- Inventor: Zhong-Gui Zhang
- Applicant: UNITED MICROELECTRONICS CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: UNITED MICROELETRONICS CORPORATION
- Current Assignee: UNITED MICROELETRONICS CORPORATION
- Current Assignee Address: TW Hsinchu
- Agent Ding Yu Tan
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method for compensating a slit illumination uniformity includes executing a first lithography operation and recording an initial slit uniformity profile; executing a slit uniformity optimization process and recording an optimized slit uniformity profile; and offsetting the optimized slit uniformity profile to obtain a working slit uniformity profile such that the working slit uniformity profile has a mean value closest to that of the initial slit uniformity profile.
Public/Granted literature
- US20150331328A1 METHOD FOR COMPENSATING SLIT ILLUMINATION UNIFORMITY Public/Granted day:2015-11-19
Information query
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