公开(公告)号：US09411240B2

公开(公告)日：2016-08-09

申请号：US14277788

申请日：2014-05-15

Applicant: UNITED MICROELECTRONICS CORPORATION

Inventor： Zhong-Gui Zhang

IPC: G03F7/20

CPC classification number: G03F7/70066 ,  G03F7/20 ,  G03F7/70083 ,  G03F7/70558

Abstract: A method for compensating a slit illumination uniformity includes executing a first lithography operation and recording an initial slit uniformity profile; executing a slit uniformity optimization process and recording an optimized slit uniformity profile; and offsetting the optimized slit uniformity profile to obtain a working slit uniformity profile such that the working slit uniformity profile has a mean value closest to that of the initial slit uniformity profile.

Abstract translation: 用于补偿狭缝照射均匀性的方法包括执行第一光刻操作并记录初始狭缝均匀性轮廓; 执行狭缝均匀性优化处理并记录优化的狭缝均匀性轮廓; 并且抵消优化的狭缝均匀度轮廓以获得工作狭缝均匀性轮廓，使得工作狭缝均匀性轮廓具有最接近初始狭缝均匀性轮廓的平均值。