Invention Grant
- Patent Title: Sapphire property modification through ion implantation
- Patent Title (中): 通过离子注入改善蓝宝石性能
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Application No.: US13783264Application Date: 2013-03-02
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Publication No.: US09416442B2Publication Date: 2016-08-16
- Inventor: Dale N. Memering , Christopher D. Prest , Douglas Weber
- Applicant: Apple Inc.
- Applicant Address: US CA Cupertino
- Assignee: APPLE INC.
- Current Assignee: APPLE INC.
- Current Assignee Address: US CA Cupertino
- Agency: Brownstein Hyatt Farber Schreck, LLP
- Main IPC: C23C14/48
- IPC: C23C14/48 ; C03C21/00 ; C30B29/20 ; C30B31/22 ; H01J37/32

Abstract:
Systems and methods for strengthening a sapphire part are described herein. One method may take the form of orienting a first surface of a sapphire member relative to an ion implantation device, selecting an ion implantation concentration and directing ions at the first surface of the sapphire member. The ions are embedded under the first surface to create compressive stress in the sapphire surface.
Public/Granted literature
- US20140248472A1 SAPPHIRE PROPERTY MODIFICATION THROUGH ION IMPLANTATION Public/Granted day:2014-09-04
Information query
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