Invention Grant
- Patent Title: In situ cleaning system
- Patent Title (中): 原位清洁系统
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Application No.: US13888067Application Date: 2013-05-06
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Publication No.: US09421586B2Publication Date: 2016-08-23
- Inventor: Kim R. Smith , Keith E. Olson , Erik C. Olson , Michael S. Rischmiller
- Applicant: ECOLAB USA INC.
- Applicant Address: US MN St. Paul
- Assignee: Ecolab USA Inc.
- Current Assignee: Ecolab USA Inc.
- Current Assignee Address: US MN St. Paul
- Agency: McKee, Voorhees & Sease, PLC
- Main IPC: B08B3/00
- IPC: B08B3/00 ; B08B3/10 ; B08B3/08 ; C02F1/461 ; C02F1/467 ; C02F5/08 ; C02F1/68 ; C02F103/02
Abstract:
In situ cleaning systems and methods of use are disclosed and provide cleaning use solutions with minimal chemical additives providing environmentally-friendly cleaning compositions. The in situ cleaning system provides one or more in situ cleaning components, including water treatment components, oxidizing agent generating component and/or alkalinity generating component, providing a cleaning use solution to a washing system.
Public/Granted literature
- US20130255731A1 IN SITU CLEANING SYSTEM Public/Granted day:2013-10-03
Information query
