Invention Grant
- Patent Title: P-I-N photodiode with dopant diffusion barrier layer
- Patent Title (中): 具有掺杂剂扩散阻挡层的P-I-N光电二极管
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Application No.: US14048379Application Date: 2013-10-08
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Publication No.: US09425341B2Publication Date: 2016-08-23
- Inventor: Andy Eu-Jin Lim , Tsung-Yang Liow , Patrick Guo-Qiang Lo
- Applicant: Agency for Science, Technology and Research
- Applicant Address: SG Singapore
- Assignee: Agency for Science, Technology and Research
- Current Assignee: Agency for Science, Technology and Research
- Current Assignee Address: SG Singapore
- Agency: Schwegman Lundberg & Woessner, P.A.
- Priority: SG201207481-1 20121008
- Main IPC: H01L31/075
- IPC: H01L31/075 ; H01L31/105 ; H01L31/117 ; H01L31/18

Abstract:
According to one aspect of the invention, there is provided a pin photodetector comprising a dopant diffusion barrier layer disposed within an active light absorbing region of the pin photodetector.
Public/Granted literature
- US20140138789A1 P-I-N PHOTODIODE Public/Granted day:2014-05-22
Information query
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