利索-全球专利检索

  1. 登录
  2. 注册
发明授权
US09428485B2 Salt, photoresist composition and method for producing photoresist pattern 有权
盐，光致抗蚀剂组合物和制造光致抗蚀剂图案的方法

Salt, photoresist composition and method for producing photoresist pattern
摘要：
A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A1 represents a C1-C30 monovalent organic group, X1 represents a C1-C10 aliphatic hydrocarbon group where a hydrogen atom may be replaced by a hydroxy group, m1 and m2 independently each represent an integer of 1 to 4, and Z+ represents an organic cation.
摘要（中）：

由式（I）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，A1表示C1-C30一价有机基团，X1表示C1-C10脂族烃基，其中氢原子 可以被羟基取代，m1和m2独立地表示1〜4的整数，Z +表示有机阳离子。

公开/授权文献
信息查询
Espacenet
0/0