Invention Grant
- Patent Title: Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
- Patent Title (中): 基片支架，光刻设备，器件制造方法以及衬底保持器的制造方法
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Application No.: US14374197Application Date: 2013-01-17
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Publication No.: US09442395B2Publication Date: 2016-09-13
- Inventor: Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/050818 WO 20130117
- International Announcement: WO2013/113568 WO 20130808
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20 ; B23Q3/18 ; B05D3/06 ; B05D5/00 ; B23K26/00
Abstract:
A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
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