Invention Grant
US09448477B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device
有权
光敏感或辐射敏感性树脂组合物，抗蚀剂膜，图案形成方法，使用其的电子装置的制造方法和电子装置
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device
- Patent Title (中): 光敏感或辐射敏感性树脂组合物，抗蚀剂膜，图案形成方法，使用其的电子装置的制造方法和电子装置
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Application No.: US14656997Application Date: 2015-03-13
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Publication No.: US09448477B2Publication Date: 2016-09-20
- Inventor: Takeshi Kawabata , Hideaki Tsubaki , Hiroo Takizawa
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2012-202082 20120913; JP2013-102603 20130514; JP2013-169955 20130819
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/32 ; G03F7/004 ; C08F8/32
Abstract:
There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a repeating unit represented by the specific formula and a group capable of decomposing by an action of an acid to produce a polar group; and an ionic compound represented by the specific formula, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition.
Public/Granted literature
Information query
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