Invention Grant
- Patent Title: Method of forming a package substrate
- Patent Title (中): 形成封装基板的方法
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Application No.: US13620225Application Date: 2012-09-14
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Publication No.: US09449909B2Publication Date: 2016-09-20
- Inventor: Chin-Sung Lin , Li-Hua Lin , Yu-Yu Lin
- Applicant: Chin-Sung Lin , Li-Hua Lin , Yu-Yu Lin
- Applicant Address: TW Hsin-Chu TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.,Global Unichip Corp.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.,Global Unichip Corp.
- Current Assignee Address: TW Hsin-Chu TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H05K3/34
- IPC: H05K3/34 ; H01L23/498 ; H01L23/50 ; H05K1/02 ; H01L23/00

Abstract:
In accordance with an embodiment, a method comprises providing a substrate having a conductive material thereon, forming a ground plane, a first trace rail, and a first perpendicular trace from the conductive material, and forming an insulator material over the ground plane, the first trace rail, and the first perpendicular trace. The ground plane is between the first trace rail and an area of the substrate over which will be a die. The first trace rail extends along a first outer edge of the ground plane, and the first perpendicular trace is coupled to the first trace rail and extends perpendicularly from the first trace rail.
Public/Granted literature
- US20130015234A1 Method of Forming a Package Substrate Public/Granted day:2013-01-17
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