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US09450071B2 Field effect semiconductor devices and methods of manufacturing field effect semiconductor devices 有权
场效应半导体器件及制造场效半导体器件的方法

Field effect semiconductor devices and methods of manufacturing field effect semiconductor devices
摘要：
Field effect semiconductor devices and methods of manufacturing the same are provided, the field effect semiconductor devices include a second semiconductor layer on a first surface of a first semiconductor layer, a first and a second third semiconductor layer respectively on two sides of the second semiconductor layer, a source and a drain respectively on the first and second third semiconductor layer, and a gate electrode on a second surface of the first semiconductor layer.
摘要（中）：

提供了场效应半导体器件及其制造方法，场效应半导体器件包括在第一半导体层的第一表面上的第二半导体层，以及分别在第二半导体层的两侧上的第一和第二第三半导体层 ，分别在第一和第二第三半导体层上的源极和漏极，以及在第一半导体层的第二表面上的栅电极。

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