Invention Grant
- Patent Title: Plasma generating apparatus
- Patent Title (中): 等离子体发生装置
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Application No.: US14363481Application Date: 2012-12-07
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Publication No.: US09452236B2Publication Date: 2016-09-27
- Inventor: Makoto Miyamoto , Kazutoshi Takenoshita , Yukika Yamada , Yoshitaka Terao , Nobutake Hirai
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-Si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-Si
- Agency: Staas & Halsey LLP
- Priority: JP2011-268605 20111208; JP2011-270445 20111209; JP2011-270503 20111209
- International Application: PCT/JP2012/081827 WO 20121207
- International Announcement: WO2013/085045 WO 20130613
- Main IPC: A61L9/22
- IPC: A61L9/22 ; H05H1/24 ; F24F3/16 ; H01B13/00 ; H01T19/00 ; H01T23/00

Abstract:
Disclosed herein is a plasma generating apparatus capable of sufficiently performing a deodorization function and a sterilization function by increasing a generation amount of ions or radicals while suppressing generation of ozone. The plasma generating apparatus has a pair of electrodes (21 and 22) provided with dielectric films (21a and 22a) and serves to apply a predetermined voltage between the electrodes (21 and 22) to discharge plasma, fluid circulation holes (21b and 22b) are respectively provided at corresponding positions of the respective electrodes (21 and 22) and pass through the electrodes, and plasma is generated only in opening end portions (21x and 22x) forming the fluid circulation holes (21b and 22b) between the pair of electrodes (21 and 22).
Public/Granted literature
- US20150125356A1 PLASMA GENERATING APPARATUS Public/Granted day:2015-05-07
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