Invention Grant
- Patent Title: Apparatus and method of inspecting a defect of an object
- Patent Title (中): 检查物体缺陷的装置和方法
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Application No.: US14142093Application Date: 2013-12-27
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Publication No.: US09453800B2Publication Date: 2016-09-27
- Inventor: Akio Ishikawa , Mitsuhiro Togashi , Mitsunori Numata
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel & Sibley, P.A.
- Priority: JP10-2012-286202 20121227
- Main IPC: G01N21/21
- IPC: G01N21/21 ; G01N21/95 ; G01N21/88 ; G01N21/956

Abstract:
An apparatus for detecting a defect of an object may include a light emitter configured to emit straight polarized lights having different polarized directions, a spatial filter having openings through which the straight polarized lights selectively pass, an optical member configured to condense the straight polarized lights, which pass through the openings, on the object, and a light detector configured to detect lights reflected from the object. Thus, the defect may be accurately detected in a short time.
Public/Granted literature
- US20140185044A1 Apparatus and Method of Inspecting a Defect of an Object Public/Granted day:2014-07-03
Information query