Invention Grant
US09455037B2 EEPROM memory cell with low voltage read path and high voltage erase/write path
有权
具有低电压读取通道和高电压擦除/写入通道的EEPROM存储单元
- Patent Title: EEPROM memory cell with low voltage read path and high voltage erase/write path
- Patent Title (中): 具有低电压读取通道和高电压擦除/写入通道的EEPROM存储单元
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Application No.: US14209275Application Date: 2014-03-13
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Publication No.: US09455037B2Publication Date: 2016-09-27
- Inventor: Kent Hewitt , Jack Wong , Bomy Chen , Sonu Daryanani , Jeffrey A. Shields , Daniel Alvarez , Mel Hymas
- Applicant: Microchip Technology Incorporated
- Applicant Address: US AZ Chandler
- Assignee: MICROCHIP TECHNOLOGY INCORPORATED
- Current Assignee: MICROCHIP TECHNOLOGY INCORPORATED
- Current Assignee Address: US AZ Chandler
- Agency: Slayden Grubert Beard PLLC
- Main IPC: G11C11/34
- IPC: G11C11/34 ; G11C16/04 ; H01L29/423 ; H01L29/788

Abstract:
An electrically erasable programmable read only memory (EEPROM) cell may include a substrate including at least one active region, a floating gate adjacent the substrate, a write/erase gate defining a write/erase path for performing high voltage write and erase operations, and a read gate defining a read path for performing low voltage read operations, wherein the read path is distinct from the write/erase path. This allows for a smaller read gate oxide, thus allowing the cell size to be reduced. Further, the EEPROM cell may include two independently controllable read gates, thereby defining two independent transistors which allows better programming voltage isolation. This allows the memory array to be drawn using a common source instead of each column of EEPROM cells needing its own source line. This makes the array more scalable because the cell x-dimension would otherwise be limited by each column needing two metal 1 pitches.
Public/Granted literature
- US20140269102A1 EEPROM MEMORY CELL WITH LOW VOLTAGE READ PATH AND HIGH VOLTAGE ERASE/WRITE PATH Public/Granted day:2014-09-18
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